Oxidation and Moisture Barrier Layers for Wire Grid Polarizer

ABSTRACT

A wire grid polarizer (WGP) can have a conformal-coating to protect the WGP from oxidation and/or corrosion. The conformal-coating can include a barrier layer with at least one: of aluminum oxide, silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, hafnium oxide, and zirconium oxide. A method of making a WGP can include applying the barrier layer over ribs of a WGP by vapor deposition.

CLAIM OF PRIORITY

This application claims priority to U.S. Provisional Patent ApplicationNos. 62/142,854, filed on Apr. 3, 2015; 62/190,188, filed on Jul. 8,2015; 62/216,782, filed on 9/10/2015; 62/209,024, filed on Aug. 24,2015; 62/242,883, filed on Oct. 16, 2015; and 62/265,773, filed on Dec.10, 2015, which are hereby incorporated herein by reference in theirentirety.

FIELD OF THE INVENTION

The present application is related generally to wire grid polarizers.

BACKGROUND

Wire grid polarizers (WGPs or WGP for singular) can be used to dividelight into two different polarization states. One polarization state canpass through the WGP and the other can be absorbed or reflected. Theeffectiveness or performance of WGPs is based on a very high percenttransmission of one polarization (sometimes called Tp) and minimaltransmission of an opposite polarization (sometimes called Ts). It canbe beneficial to have high contrast (Tp/Ts). The percent reflection ofthe opposite polarization (Rs) can also be an important indicator ofpolarizer performance.

Ribs or wires of WGPs, especially for polarization of visible orultraviolet light, can have small, delicate ribs with nanometer-sizedpitch, wire-width, and wire-height. WGPs are used in systems (e.g.computer projectors, semiconductor inspection tools, etc.) that requirehigh performance. Small defects in the WGP, such as dust, corroded ribs,and collapsed ribs can significantly degrade system performance (e.g.distorted image from a computer projector). Oxidation can degradeperformance by adversely affecting contrast or Rs. Therefore, it can beimportant to protect the ribs from corrosion, oxidation, mechanicaldamage, and dust.

Water can condense or drop only onto limited portions of a WGP. Becausethe water can be in one channel but not in an adjacent channel, forcesin the water can cause ribs to topple over, thus damaging the WGP.

WGP performance can also degrade by corrosion. Water can condense ontothe WGP and wick into narrow channels between ribs due to capillaryaction. The water can then corrode the ribs. Corroded regions can havereduced contrast, changed Rs, or can fail to polarize at all.

Oxidization of the ribs can also degrade WGP performance. For example,as an aluminum wire forms a natural oxide over time, the underlying,substantially-pure aluminum is consumed, thus reducing the size of thesubstantially-pure aluminum wire and changing polarizationcharacteristics of the WGP.

Protective coatings have been applied by dipping the WGP in an aqueoussolution containing the coating. The coating can adhere to the ribs,then the WGP can be removed from the aqueous solution. Aminophosphonates, as described in U.S. Pat. No. 6,785,050, have commonlybeen applied in this manner. Application of protective coatings by thismethod has been reasonably successful for some wire materials, such asfor example aluminum and silicon, but may be insufficient for WGPprotection in extreme environments. Silicon is used inselectively-absorptive WGPs to absorb one polarization of light, andthus reduce Rs. The performance of such silicon-containing WGPs candegrade over time as shown by gradually-increasing Rs.

Protective coatings can adversely affect polarizer performance. Forexample, the coating can cause a reduction of Tp. Thicker coatings maybe needed for to provide sufficient oxidation or corrosion protection,but thinner coatings may be preferred in order to minimize performancedegradation by the coating.

SUMMARY

It has been recognized that it would be advantageous to (1) protect wiregrid polarizers (WGPs or WGP for singular) from oxidation, corrosion,and dust; (2) protect wire grid polarizers from damage due to tensileforces in a liquid on the wire grid polarizer; and (3) reduce wire gridpolarizer performance degradation over time.

The present invention is directed to various embodiments of WGPs withprotective coatings, and methods of making WGPs with protectivecoatings, that satisfy these needs. Each embodiment may satisfy one,some, or all of these needs.

The WGP can comprise ribs located over a surface of a transparentsubstrate with gaps between at least a portion of the ribs. Aconformal-coating can be located over the ribs. The conformal-coatingcan include a barrier layer, which can include at least one: of aluminumoxide, silicon oxide, silicon nitride, silicon oxynitride, siliconcarbide, hafnium oxide, and zirconium oxide. The method of making a WGPcan include applying the barrier layer over ribs of a WGP by vapordeposition.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1-3 are schematic cross-sectional side views of WGPs 10, 20, and30, each with a conformal-coating 13 located over ribs 12, in accordancewith embodiments of the present invention. The conformal-coating 13 inFIG. 1 includes a single layer—a distal conformal-coating 13 _(d). Theconformal-coating 13 in FIG. 2 includes two layers—a proximalconformal-coating 13 _(p) and a distal conformal-coating 13 _(d). Theconformal-coating 13 in FIG. 3 includes three layers—a proximalconformal-coating 13 _(p), a middle conformal-coating 13 _(m), and adistal conformal-coating 13 _(d).

FIG. 4 is a schematic cross-sectional side view of a WGP 40 with aconformal-coating 13, including a hydrophobic-layer, designed to keepwater 41, on a surface of the ribs 12, in a Cassie-Baxter state, inaccordance with an embodiment of the present invention.

FIG. 5 is a schematic cross-sectional side view of a WGP 10 with arrayof ribs 12 located over a surface of a transparent substrate 11, inaccordance with an embodiment of the present invention. Each of the ribs12 can include different regions 14 and 15 with different materials. Aconformal-coating 55 with one chemistry can adhere to one region 15 anda conformal-coating 54 with a different chemistry can adhere to adifferent region 14.

FIG. 6 is a schematic perspective-view of a WGP in accordance with anembodiment of the present invention.

FIG. 7 is a graphical plot of the relationship between wavelength andreflectance of one polarization (Rs) in: (1) a WGP that includesgermanium, in accordance with an embodiment of the present invention;and (2) WGPs that include silicon, in accordance with the prior-art.

FIGS. 8-9 are schematic views of image projectors 80 and 90 withbroadband, selectively-absorptive, WGPs 84, in accordance withembodiments of the present invention.

FIGS. 10 shows an integrated circuit (IC) inspection tool 100 includinga WGP 104, in accordance with embodiments of the present invention.

FIG. 11 shows a flat panel display (FPD) manufacturing tool 110including a WGP 114, in accordance with an embodiment of the presentinvention.

DEFINITIONS

As used herein, “alkyl” refers to a branched, unbranched, or cyclicsaturated hydrocarbon group. Alkyls include, but are not limited to,methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, t-butyl, octyl,and decyl, for example, as well as cycloalkyl groups such ascyclopentyl, and cyclohexyl, for example. The “alkyl” can typically berelatively small to facilitate vapor deposition, if overall atomicweight of the molecule is considered, such as for example ≦2 carbonatoms in one aspect, ≦3 carbon atoms in another aspect, ≦5 carbon atomsin another aspect, or ≦10 carbon atoms in another aspect. As usedherein, “substituted alkyl” refers to an alkyl substituted with one ormore substituent groups. The term “heteroalkyl” refers to an alkyl inwhich at least one carbon atom is replaced with a heteroatom. If nototherwise indicated, the term “alkyl” includes unsubstituted alkyl,substituted alkyl, and heteroalkyl.

As used herein, “aryl” refers to a group containing a single aromaticring or multiple aromatic rings that are fused together, directlylinked, or indirectly linked (such that the different aromatic rings arebound to a common group such as a methylene or ethylene moiety). Arylgroups include, for example, phenyl, naphthyl, anthryl, phenanthryl,biphenyl, diphenylether, diphenylamine, and benzophenone. The term“substituted aryl” refers to an aryl group comprising one or moresubstituent groups. The term “heteroaryl” refers to an aryl group inwhich at least one carbon atom is replaced with a heteroatom. If nototherwise indicated, the term “aryl” includes unsubstituted aryl,substituted aryl, and heteroaryl.

As used herein, the phrase “bond to the ribs” or similar phrases (e.g.“Z is a bond to the ribs”) can mean a direct bond between the chemicaland the ribs or a bond to an intermediate layer which is bondeddirectly, or through other layer(s) to the ribs. Thus, these layer(s)can be other conformal-coating(s).

As used herein, the term “carbon chain” means a chain of carbon atomslinked together, including at least three carbon atoms in a row (e.g.—C—C—C—, —C═C—C—, etc.). The term carbon chain can include at least fivecarbon atoms in a row in one aspect, at least ten carbon atoms in a rowin another aspect, or at least fifteen carbon atoms in a row in anotheraspect. The term carbon chain can also include ether linkages (C-a-Cmoieties). The term carbon chain includes single, double, and triplecarbon to carbon bonds. The carbon atoms can be attached to any elementor molecule.

The term “elongated” means that a length L (see FIG. 6) of the ribs 12is substantially greater than rib width W12 or rib thickness T12 (seeFIG. 1). For example, WGPs for ultraviolet or visible light can oftenhave a rib width XVzz between 20 and 100 nanometers and rib thicknessT12 between 50 and 500 nanometers; and rib length L of about 1millimeter to 20 centimeters or more, depending on the application.Thus, elongated ribs 12 can have a length L that is many times (eventhousands of times) larger than rib width VVzz or rib thickness T12.

As used herein, the term “gap” means a space, opening, or divide,separating one rib from another rib. The gap can be filled with avacuum, gas, liquid, or solid, unless otherwise specified.

As used herein, the unit “sccm” means cubic centimeters per minute at 0°C. and 1 atmosphere pressure.

As used herein, the term “substrate” includes a base material, such asfor example a glass wafer. The term “substrate” includes a singlematerial, and also includes multiple materials (e.g. layered, composite,or the like), such as for example a glass wafer with at least one thinfilm on a surface of the wafer used together as the base material.

Many materials used in optical structures absorb some light, reflectsome light, and transmit some light. The following definitions areintended to distinguish between materials or structures that areprimarily absorptive, primarily reflective, or primarily transparent.Each material can be primarily absorptive, primarily reflective, orprimarily transparent in a specific wavelength of interest (e.g. all ora portion of the ultraviolet, visible, or infrared spectrums of light)and can have a different property in a different wavelength of interest.

1. As used herein, the term “absorptive” means substantially absorptiveof light in the wavelength of interest.

-   -   a. Whether a material is “absorptive” is relative to other        materials used in the polarizer. Thus, an absorptive structure        will absorb substantially more than a reflective or a        transparent structure.    -   b. Whether a material is “absorptive” is dependent on the        wavelength of interest. A material can be absorptive in one        wavelength range but not in another.    -   c. In one aspect, an absorptive structure can absorb greater        than 40% and reflect less than 60% of light in the wavelength of        interest (assuming the absorptive structure is an optically        thick film—i.e. greater than the skin depth thickness    -   d. In another aspect, an absorptive material can have a high        extinction coefficient (k), relative to a transparent material,        such as for example greater than 0.01 in one aspect or greater        than 1.0 in another aspect.    -   e. Absorptive ribs can be used for selectively absorbing one        polarization of light.

2. As used herein, the term “reflective” means substantially reflectiveof light in the wavelength of interest.

-   -   a. Whether a material is “reflective” is relative to other        materials used in the polarizer. Thus, a reflective structure        will reflect substantially more than an absorptive or a        transparent structure.    -   b. Whether a material is “reflective” is dependent on the        wavelength of interest. A material can be reflective in one        wavelength range but not in another. Some wavelength ranges can        effectively utilize highly reflective materials. At other        wavelength ranges, especially lower wavelengths where material        degradation is more likely to occur, the choice of materials may        be more limited and an optical designer may need to accept        materials with a lower reflectance than desired.    -   c. In one aspect, a reflective structure can reflect greater        than 80% and absorb less than 20%, of light in the wavelength of        interest (assuming the reflective structure is an optically        thick film—i.e. greater than the skin depth thickness).

d. Metals are often used as reflective materials.

e. Reflective wires can be used for separating one polarization of lightfrom an opposite polarization of light.

3. As used herein, the term “transparent” means substantiallytransparent to light in the wavelength of interest.

-   -   a. Whether a material is “transparent” is relative to other        materials used in the polarizer. Thus, a transparent structure        will transmit substantially more than an absorptive or a        reflective structure.    -   b. Whether a material is “transparent” is dependent on the        wavelength of interest. A material can be transparent in one        wavelength range but not in another.

c. In one aspect, a transparent structure can transmit greater than 90%and absorb less than 10% of light at the wavelength of interest orwavelength range of use, ignoring Fresnel reflection losses.

d. In another aspect, a transparent structure can have an extinctioncoefficient (k) of less than 0.01, less than 0.001, or less than 0.0001in another aspect, at the wavelength of interest or wavelength range ofuse.

4. As used in these definitions, the term “material” refers to theoverall material of a particular structure. Thus, a structure that is“absorptive” is made of a material that as a whole is substantiallyabsorptive, even though the material may include some reflective ortransparent components. Thus for example, a rib made of a sufficientamount of absorptive material so that it substantially absorbs light isan absorptive rib even though the rib may include some reflective ortransparent material embedded therein.

DETAILED DESCRIPTION

As illustrated in FIGS. 1-6, wire grid polarizers (WGPs or WGP forsingular) 10, 20, 30, 40, 50, and 60 are shown comprising ribs 12located over a surface of a transparent substrate 11. The ribs 12 can beelongated and arranged in a substantially parallel array. In someembodiments, the ribs 12 can have a small pitch P (see FIG. 1), such asfor example a pitch P of less than 200 nanometers in one aspect or lessthan 150 nanometers in another aspect.

There can be gaps G between at least a portion of the ribs 12 (i.e. agap G between a rib 12 and an adjacent rib 12). The gaps G can be filledwith air in one aspect, a liquid in another aspect, a transparent,solid, dielectric material in another aspect, or combinations thereof.

As shown in FIGS. 1-5, a conformal-coating 13 can be located over theribs 12. The conformal-coating 13 can also be located over an exposedsurface of the substrate 11 (“exposed surface” meaning a surface of thesubstrate not covered with ribs 12). Use of a conformal-coating 13 canbe beneficial because by following a contour of the ribs 12 and anexposed surface of the substrate 11, conformal-coating thickness T_(p),T_(m), and T_(d), can be minimized, thus reducing any detrimental effectof the conformal-coating(s) 13 on WGP performance. The conformal-coating13 can cover an exposed surface of the ribs 12. The conformal-coating 13can include a barrier-layer, a hydrophobic-layer, or both. Thebarrier-layer can include an oxidation-barrier, a moisture-barrier, orboth.

The conformal-coating 13 can include a single layer (FIG. 1) ormultiple, different layers (see FIGS. 2-3) across all or substantiallyall of the ribs 12. The conformal-coating 13 can include at least oneof: a proximal conformal-coating 13 _(p), a middle conformal-coating 13_(m), and a distal conformal-coating 13 _(d). It can be important tohave sufficient thickness T_(o), T_(m), and T_(d) for each of theselayers 13 _(p), 13 _(m), and 13 _(d), respectively, of theconformal-coating 13, in order to provide sufficient protection to theribs 12 and/or to provide a base for an upper layer of theconformal-coating 13. Thus, one or more of the proximalconformal-coating 13 _(p), the middle conformal-coating 13 _(m), and thedistal conformal-coating 13 _(d) can have a thickness T_(p), T_(m), orT_(d) that is at least 0.1 in one aspect, at least 0.5 nanometers inanother aspect, or at least 1 nanometer in another aspect.

It can be important to have a sufficiently small thickness T_(p), T_(m),and T_(d) for each of these layers 13 _(p), 13 _(m), and 13 _(d),respectively, of the conformal-coating 13, in order to avoid or minimizedegradation of WGP performance caused by the conformal-coating 13. Thus,one or more of the proximal conformal-coating 13 _(p), the middleconformal-coating 13 _(m), and the distal conformal-coating 13 _(d) canhave a thickness T_(p), T_(m), or T_(d) that is less than 2 nanometersin one aspect, less than 3 nanometers in another aspect, less than 5nanometers in another aspect, less than 10 nanometers in another aspect,less than 15 nanometers in another aspect, or less than 20 nanometers inanother aspect.

These thickness values can be a minimum thickness or a maximum thicknessat any location of the conformal-coating 13, or simply a thickness at alocation of the conformal-coating 13. Each layer of theconformal-coating 13 can be a monolayer.

Alternatively, as shown in FIG. 5, a conformal-coating 55 with onechemistry can adhere to one region 15 and a conformal-coating 54 with adifferent chemistry can adhere to a different region 14. The chemistryof multiple, different, conformal-coatings can be selected such thatdifferent regions of the WGP, with different chemistries, can beprotected.

Hydrophobic-Layer Description

The conformal-coating 13 can include a hydrophobic-layer. Thehydrophobic-layer can include a phosphonate conformal-coating, which caninclude:

where each R¹ can independently be a hydrophobic group, Z can be a bondto the ribs, and R⁵ can be any suitable chemical element or group. Forexample, R⁵ can be a phosphonate-reactive-group, R¹, or R⁶. Thephosphonate-reactive-group can be a chemical element or group likely toreact to form an additional bond Z to the ribs 12, such as but notlimited to —Cl, —OR⁶, —OCOR⁶, or —OH. Each R⁶ can independently be analkyl group, an aryl group, or combinations thereof.

The hydrophobic-layer can alternatively or in addition include a silaneconformal-coating, which can include chemical formula (1), chemicalformula (2), or combinations thereof:

where r can be a positive integer, X can be a bond to the ribs, and eachR³ can be independently a chemical element or a group. Each R¹, asmentioned above, can independently be a hydrophobic group.

Each R³ can be independently selected from the group consisting of: asilane-reactive-group, —H, R¹, and R⁶. R⁶ was defined above. Eachsilane-reactive-group can be independently selected from the groupconsisting of: —Cl, —OR⁶, —OCOR⁶, —N(R⁶)₂, and —OH.

R³ and/or R⁵ can be a small group, such as for example —OCH₃, to alloweasier vapor-deposition. Benefits of vapor-deposition are describedbelow.

The hydrophobic-layer can alternatively or in addition include a sulfurconformal-coating, which can include:

where T can be a bond to the ribs and each R¹, as mentioned above, canindependently be a hydrophobic group.

As shown in FIGS. 1-3, each rib 12 can include different regions 15 and14, such as an upper-rib 15 and a lower-rib 14. The lower-rib 14 can besandwiched between the upper-rib 15 and the substrate 11. At least oneof these (lower-rib 14 or upper-rib 15) can be reflective (e.g. aluminumfor visible light) and can be called a wire. At least one of these(lower-rib 14 or upper-rib 15) can be absorptive or transparent and canbe called a rod. For example, for a selectively-absorptive WGP, withlight incident from the rib 12 side, the rod can be absorptive and canbe the upper-rib 15, and the wire can be the lower-rib 14. See U.S. Pat.No. 7,961,393 which is incorporated by reference herein.

It can be difficult to protect both the rod and the wire, becauseprotective chemistry that adheres well for one might not adhere well tothe other. At least two of the silane conformal-coating, the phosphonateconformal-coating, and the sulfur conformal-coating can be applied tothe ribs 12. One of these can preferentially adhere to the rod and theother can preferentially adhere to the wire, thus providing effectiveprotection to both. Money can be saved by using the phosphonatechemistry and the silane chemistry instead of just the silaneconformal-coating because the phosphonate chemistry is presently lessexpensive than the silane chemistry. Thus, by combining the silane withthe phosphonate, less of the expensive silane chemistry is needed. Forexample, the rod can be the upper-rib 15, can be made of silicon, andthe silane conformal-coating 55 can preferentially adhere to the siliconupper-rib 15; and the wire can be the lower-rib 15, can be made ofaluminum, and the phosphonate conformal-coating 54 can preferentiallyadhere to the aluminum lower-rib 15.

X can be a bond to the rod. For example, X can be —O—Si. T and/or Z canbe a bond to the wire. For example, T and/or Z can be —O-Metal, whereMetal is a metal atom. Thus, the silane conformal-coating canpreferentially attach to one material (e.g. silicon) and the phosphonateconformal-coating or the sulfur conformal-coating can preferentiallyattach to another material (e.g. a metal) to provide protection tomultiple rib 12 materials.

It can be beneficial if the chemicals in the hydrophobic-layer includemolecules that each has multiple bonds T, Z, and/or X to the ribs 12. Byeach molecule forming multiple bonds X, more of the underlying surface(e.g. rib 12, proximal conformal-coating 13 _(p), or middleconformal-coating 13 _(m)) can be bound and thus unavailable for bondingor interaction with undesirable chemicals, such as water for example.Also, multiple bonds to the surface can improve resiliency of thehydrophobic-layer because it can be less likely for multiple bonds Z/X/Tto fail than for a single bond Z/X/T to fail.

Thus, R¹ can be:

where A is a central atom, R⁷ can be a hydrophobic group as describedabove, g can be an integer from 1 to 3, and R⁸ can be moiety (1), moiety(2), moiety (3), or combinations thereof:

R³ and R⁵ were described above. The central atom A can be selected fromgroup III, IV, or V in the periodic table in one aspect or can beselected from the group consisting of carbon, nitrogen, phosphorous, andsilicon in another aspect.

For example, for g=2, the phosphonate conformal-coating, and moiety (3),the resulting chemical formula can be:

Another way for molecules in the hydrophobic-layer to form multiplebonds Z, and/or X to the ribs 12 is for R⁵ to be Z and/or for R³ to beX. This can be accomplished if, in the phosphonate chemistry as applied,R⁵ is a phosphonate-reactive-group and/or if, in the silane chemistry asapplied, R³ is a silane-reactive-group.

The hydrophobic group can be or can include a carbon chain in one aspectand can include at least one halogen bonded to a carbon in anotheraspect. The carbon chain can include a perfluorinated group including atleast 1 carbon atom in one aspect or at least 3 carbon atoms in anotheraspect. The perfluorinated group can include less than 20 carbon atomsin another aspect, less than 30 carbon atoms in another aspect, or lessthan 40 carbon atoms in another aspect. It can be beneficial for theperfluorinated group to have at least 4 carbon atoms to provide ahydrophobic chain. It can be beneficial for the perfluorinated group tonot be too long or have too many carbon atoms in order to maintain ahigh enough vapor pressure to allow vapor-deposition.

For example, the carbon chain of R¹ can include CF₃(CF₂)_(n). Due to thehigh electronegativity of fluorine, it can be beneficial to have ahydrocarbon chain to separate the perfluorinated group from thephosphorous or sulfur. Thus, the carbon chain of R′ can includeCF₃(CF₂)_(n)(CH₂)_(m), where n can be an integer within the boundariesof 0≦n≦20 in one aspect or 4≦n≦10 in another aspect, and m can be aninteger within the boundaries of 0≦m≦5 in one aspect or 2≦m≦5 in anotheraspect.

In order to allow vapor-deposition, it can be important for some or allof the conformal-coating chemistry to have a relatively lower molecularweight, but it can also be important for the carbon chain to be longenough to provide sufficient hydrophobicity. Thus, each molecule in thephosphonate conformal-coating (excluding the bond to the ribs Z), eachmolecule in the silane conformal-coating (excluding the bond to the ribsX), and/or each molecule in the sulfur conformal-coating (excluding thebond to the ribs T), can have a molecular weight of at least 100 gramsper mole in one aspect, at least 150 grams per mole in another aspect,or at least 400 grams per mole in another aspect, and less than 600grams per mole in one aspect, less than 1000 grams per mole in anotheraspect, or less than 1500 grams per mole in another aspect.

In the hydrophobic-layer, it can be important to have a strong bondbetween silicon (Si) and R¹, between phosphorous (P) and R′, and/orbetween sulfur (5) and R¹, to avoid the R¹ group breaking away from Si,P, or S. Thus, the bond between silicon (Si) and R¹ can be a silicon tocarbon bond (Si—C); the bond between phosphorous (P) and R¹ can be aphosphorous to carbon bond (P—C); and/or the bond between sulfur (5) andR¹ can be a sulfur to carbon bond (S—C).

The hydrophobic-layer located on the ribs 12 can provide a hydrophobicsurface, which can be a superhydrophobic surface, depending on thechemistry and the structure of the ribs, such as pitch P and rib widthW12. As shown in FIG. 4, the WGP and conformal-coating 13 can include ahydrophobic-layer and can be capable of keeping water 41, on a surfaceof the ribs 12, in a Cassie-Baxter state. Having water on the WGP 10 ina Cassie-Baxter state can be beneficial because the water 41 does notsubstantially enter or remain in the gaps G, thus avoiding or reducingcorrosion on sides of the ribs 12 and avoiding or reducing toppling ofthe ribs 12 due to water's tensile forces. Also, if the water 41 is in aCassie-Baxter state, the water can more easily roll off the surface ofthe WGP, often carrying dust particles with it. A water contact angle Acan be greater than 110° in one aspect, greater than 120° in anotheraspect, greater than 130° in another aspect, or greater than 140° inanother aspect.

Soluble WGP Materials

As described above, at least one of the lower-rib 14 or upper-rib 15 canbe reflective (e.g. aluminum for visible light) and can be called a wireand at least one can be absorptive or transparent and can be called arod. The rod can be made of silicon, an absorptive material for visiblelight. Silicon-containing, selectively-absorptive WGPs have been used inimage projectors. Selectively-absorptive WGPs can substantially allowone polarization (e.g. p-polarized light) to pass through and can absorban opposite polarization (e.g. s-polarized light). In an imageprojector, the p-polarized light can be used for forming the image.Ghosting of the projected image can be reduced by the WGP absorbing thes-polarized light. Some image projectors separate light into threedifferent light beams. One of these light beams can have a wavelength ofabout 450 nm, another can have a wavelength of about 550 nm, and thethird can have a wavelength of about 650 nm. In order to optimizepolarization of each light beam, different WGP designs can be used foreach different light beam.

Graphical silicon-plots Si in FIG. 7 show the relationship betweenwavelength and reflectance of one polarization (e.g. reflectance ofs-polarization Rs) of a selectively-absorptive WGP that includessilicon. The first silicon-plot Si(1) is for with a WGP having a siliconthickness selected for optimal (low) Rs at around 450 nanometers. Thesecond silicon-plot Si(2) is for with a WGP having a silicon thicknessselected for optimal (low) Rs at around 550 nanometers. The thirdsilicon-plot Si(3) is for with a WGP having a silicon thickness selectedfor optimal (low) Rs at around 650 nanometers. It would be simpler, andmanufacturing errors could be avoided, if less than three different WGPdesigns were required.

Also shown in FIG. 7 is a graphical germanium-plot Ge of therelationship between wavelength and reflectance of one polarization(e.g. s-polarization) of a selectively-absorptive WGP that includesgermanium. The WGP that includes germanium has better Rs across ⅔ ofwavelengths from 400-700 nm. Thus, use of a WGP that includes germaniumcan provide a benefit of improved Rs from about 500-700 nm. Anotherpossible benefit is that, due to the flatness of the germanium-plot Ge,one WGP design can be used for at least two of the light beams (e.g. 550and 650).

Another disadvantage of a selectively-absorptive WGP that includessilicon is that Rs tends to increase (worsen) over time, which canresult in gradually deteriorating image-projection quality over time.Selectively-absorptive WGPs that include germanium, however, show theopposite . . . Rs decreases (improves) over time, thus avoidingdeteriorating image-projection quality over time. Due to the reasonablygood initial Rs across the entire visible spectrum, and decreasing Rsover time, a single selectively-absorptive WGP that includes germaniumcan be used across the entire visible spectrum.

In one embodiment, a rod in a selectively-absorptive WGP can include atgermanium. For example, the rod can include at least 20 mass percentgermanium in one aspect, at least 50 mass percent germanium in anotheraspect, at least 80 mass percent germanium in another aspect, or atleast 95 mass percent germanium in another aspect.

A difficulty of using germanium, however, is that it has a soluble oxide(about 4.5 at 25° C.). WGP performance can decrease if the polarizer,with an exterior of the rib 12 including germanium/germanium oxide, isimmersed into an aqueous solution. Such aqueous solution can be forapplying a protective coating (e.g. amino phosphonate as taught in U.S.Pat. No. 6,785,050 which is incorporated herein by reference). Suchprotective coatings can be important to avoid corrosion of the WGP.

Other desirable WGP materials can have the same problem as germanium andtheir performance can degrade by immersing in an aqueous solution. WGPsmade with such water-soluble materials can also benefit fromanhydrous-immersion and/or vapor-deposition for applying theconformal-coating(s) 1 For example, an anhydrous method can be helpfulif a material of an exterior of the ribs 12 has solubility in water ofat least 0.015 grams per liter at 25° C. in one aspect, at least 0.02grams per liter at 25° C. in another aspect, at least 0.05 grams perliter at 25° C. in another aspect, at least 0.5 grams per liter at 25°C. in another aspect, at least 1 gram per liter at 25° C. in anotheraspect, at least 2 grams per liter at 25° C. in another aspect, or atleast 4 grams per liter at 25° C. in another aspect.

Thus, at least for WGPs with materials that are soluble in water, it canbe beneficial to have an anhydrous method for applying protectivecoatings, such as anhydrous-immersion or vapor-deposition. Non-limitingexamples of vapor-deposition methods include chemical vapor-deposition(CVD), low-pressure CVD (LPCVD), plasma-enhanced CVD, physicalvapor-deposition (PVD), atomic layer deposition (ALD), thermoreactivediffusion, electron-beam deposition, sputtering, and thermalevaporation. Anhydrous-immersion can include submersion of the WGP in ananhydrous, liquid bath. A solvent that will not dissolve rib 12materials can be selected. Vapor-deposition can be preferred overimmersion because of reduced process-waste disposal problems, reducedhealth hazards, reduced or no undesirable residue from rinsing, andvapor-deposition can be done with standard semiconductor processingequipment.

The oxidation-barrier and the moisture-barrier described below can beapplied by ALD. Some embodiments of the hydrophobic-layer have asufficiently-high vapor pressure and can be applied by vapor-deposition.

Oxidation-Barrier and Moisture-Barrier

The conformal-coating 13 can include a barrier-layer. The barrier-layercan include an oxidation-barrier, a moisture-barrier, or both. Thebarrier-layer can include a metal oxide, or layers of different metaloxides.

Oxidation of WGP ribs 12 can degrade performance of the WGP, byadversely affecting contrast or Rs. An oxidation-barrier can reduceoxidation of the ribs 12, and thus reduce or avoid such WGP performancedegradation. The term “oxidation-barrier” means a first material capableof reducing the ingress of oxygen into a second material, which maycause the second material to oxidize. An oxidation barrier can be placedon the ribs 12 to protect the ribs 12 from oxidation. Non-limitingexamples of chemicals that can be used as an oxidation-barrier include:aluminum oxide, silicon oxide, silicon nitride, silicon oxynitride,silicon carbide, or combinations thereof.

WGP corrosion can degrade WGP performance. For example, water cancondense onto the WGP and wick into narrow channels between ribs due tocapillary action. The water can then corrode the ribs. Corroded regionscan have reduced contrast, changed Rs, or can fail to polarize at all. Amoisture-barrier can resist corrosion. A moisture-barrier can protectthe ribs 12 from water or other corrosion. Examples of chemicals thatcan be used as a moisture-barrier include: hafnium oxide, zirconiumoxide, or combinations thereof.

The barrier-layer can include rare earth oxides, for example, oxides ofscandium, yttrium, lanthanum, cerium, praseodymium, neodymium,promethium, samarium, europium, gadolinium, terbium, dysprosium,holmium, erbium, thulium, ytterbium, and lutetium. These rare earthoxides can be at least part of the oxidation-barrier, themoisture-barrier, or both.

The barrier-layer can be distinct from the ribs 12, meaning (1) therecan be a boundary line or layer between the ribs 12 and thebarrier-layer; or (2) there can be some difference of material of thebarrier-layer relative to a material of the ribs 12. For example, anative aluminum oxide can form at a surface of aluminum ribs 12. A layerof aluminum oxide (oxidation-barrier) can then be applied to the ribs(e.g. by ALD). This added layer of aluminum oxide can be important,because a thickness and/or density of the native aluminum oxide can beinsufficient for protecting a core of the ribs 12 (e.g. substantiallypure aluminum) from oxidizing. In this example, although theoxidation-barrier (Al₂O₃) has the same material composition as a surface(Al₂O₃) of the ribs 12, the oxidation-barrier can still be distinct dueto (1) a boundary layer between the oxidation-barrier and the ribs 12and/or (2) a difference in material properties, such as an increaseddensity of the oxidation-barrier relative to the native aluminum oxide.

Silicon Dioxide Conformal-Coating

A silicon dioxide conformal-coating can be located between the silaneconformal-coating and the ribs 12. The silicon dioxide conformal-coatingcan help the silane conformal-coating 14 bond to the ribs 12. Thesilicon dioxide conformal-coating can be the proximal conformal-coating13 _(p) or the middle conformal-coating 13 _(m), or an additional layerof the conformal-coating 13 located between the middle conformal-coating13 _(m) and the distal conformal-coating 13 _(d).

Multiple Conformal-Coatings

The oxidation-barrier can be less effective at resisting corrosion. Themoisture-barrier and/or hydrophobic-layer can be less effective atresisting oxidation. Thus, it can be beneficial to combine both anoxidation-barrier with a moisture-barrier and/or hydrophobic-layer.

Although the moisture-barrier can resist corrosion, it can eventuallybreak down. Thus, it can be beneficial to minimize exposure of themoisture-barrier to water. A hydrophobic-layer can minimize or preventcondensed water on the WGP from attacking the moisture-barrier, thusextending the life of the moisture-barrier and the WGP. If thehydrophobic-layer perfectly covers the ribs 12, and never breaks down,then a moisture-barrier might not be needed. But, due to imperfectionsin manufacturing, there can be locations on the ribs 12 that are notcovered, or less densely covered, by the hydrophobic-layer. Themoisture-barrier can provide protection to these locations. Also, thehydrophobic-layer can break down over time. The moisture-barrier canprovide protection after such breakdown. Therefore, it can be beneficialto combine both a moisture-barrier and a hydrophobic-layer.

If the hydrophobic-layer keeps water on the ribs 12 in a Cassie-Baxterstate, then rib 12 damage, which could otherwise be caused by tensileforces in water in the gaps G, can be avoided. Also, the water can rolloff the surface of the WGP, often carrying dust particles with it, in aself-cleaning fashion. These are added benefits of the hydrophobic-layerthat might not be provided by the oxidation-barrier or themoisture-barrier.

Thus, it can be beneficial for improved WGP protection and/or forimproved adhesion of an upper-layer of the conformal-coating 13, for theconformal-coating 13 to have multiple layers, which can include at leasttwo of: an oxidation-barrier, a moisture-barrier, a silicon dioxideconformal-coating, and a hydrophobic-layer. This added protection,however, is not free. Each additional layer in the conformal-coating 13can increase WGP cost, especially if more than one tool is required toapply the multiple layers of the conformal-coating 13. Thus, adetermination of the number of layers in the conformal-coatings 13 canbe made by weighing cost against desired protection.

WGP 10 in FIG. 1 includes a conformal-coating 13 with one layer: adistal conformal-coating 13 _(d). The distal conformal-coating 13 _(d)can be the oxidation-barrier, the moisture-barrier, or thehydrophobic-layer.

WGP 20 in FIG. 2 includes a conformal-coating 13 with two layers: aproximal conformal-coating 13 _(p) located closer to the ribs 12 andsubstrate 11 and a distal conformal-coating 13 _(d) located over theproximal conformal-coating 13 _(p). The proximal conformal-coating 13_(p) and the distal conformal-coating 13 _(d) can compriseoxidation-barrier(s), moisture-barrier(s), and/or hydrophobic-layer(s).

WGP 30 in FIG. 3 includes a conformal-coating 13 with three layers: theproximal conformal-coating 13 _(p), the distal conformal-coating 13_(d), and a middle conformal-coating 13 _(m) located between theproximal conformal-coating 13 _(p) and the distal conformal-coating 13_(d). The proximal conformal-coating 13 _(p), the middleconformal-coating 13 _(m), and the distal conformal-coating 13 _(d) cancomprise oxidation-barrier(s), moisture-barrier(s), and/orhydrophobic-layer(s). Although not shown in the figures, there can bemore than three layers in the conformal-coating 13.

Order of Conformal-Coating Layers

It can be beneficial to use the moisture-barrier over theoxidation-barrier (i.e. the oxidation-barrier is proximal and themoisture-barrier is distal or middle), thus the moisture-barrier canprovide corrosion protection to the oxidation-barrier. Theoxidation-barrier can provide a good substrate for deposition of themoisture-barrier, resulting in a less porous moisture-barrier. Thus, thesame moisture protection may be obtained by a relatively thinnermoisture-barrier. This can be important because the moisture-barrier candegrade WGP performance, but such degradation can be minimized byreduced moisture-barrier thickness. Furthermore, the moisture-barriercan provide an improved surface for attachment of the hydrophobic-layer(if used).

It can be beneficial for the hydrophobic-layer to be located over thebarrier-layer (i.e. the hydrophobic-layer can be the distalconformal-coating 13 _(d)) in order to best keep moisture from enteringthe gaps G and to minimize or eliminate moisture exposure of theunderlying layer(s) in the conformal-coating 13 (e.g. the proximalconformal-coating 13 _(o) and also possibly the middle conformal-coating13 _(m)).

Image Projector

The WGPs described herein can be used in an image projector. Imageprojector 80, as shown in FIG. 8, can comprise a light source 81,color-splitting optics 82, color-combining optics 88, a projection lenssystem 85, one or more spatial light modulators 87, and one or more WGPs84.

The light source 81 can emit a beam of light 83, which can initially beunpolarized. The color-splitting optics 82 can be located to receive atleast part of the beam of light 83 and can split the beam of light 83into multiple, differently-colored light beams (colored beams) 83 _(c).The colored beams 83 _(c) can be primary colors.

Color-combining optics 88 can be located to receive and can recombine atleast some of the colored beams 83 _(c) into a combined beam or finalbeam 83 _(f). Color-combining optics 88 are sometimes called X-Cubes,X-Cube prisms, X-prisms, light recombination prisms, or cross dichroicprisms. Color-combining optics 88 are used in computer projectors forcombining different colors of light into a single image to be projected.X-Cubes are typically made of four right angle prisms, with dichroiccoatings, that are cemented together to form a cube.

The projection lens system 85 can be located to receive the combinedbeam 83 _(f) and can project a colored image 83 _(i) onto a screen 86.Although other projection lens systems can be used, exemplary projectionlens systems 85 are described in U.S. Pat. Nos. 6,585,378 and 6,447,120,which are hereby incorporated herein by reference in their entirety.

One spatial light modulator 87 can be located to receive, in each lightpath between the color-splitting optics 82 and the color-combiningoptics 88, one of the colored beams 83 _(c). Each spatial lightmodulator 87 can have a plurality of pixels. Each pixel can receive asignal. The signal can be an electronic signal. Depending on whether ornot each pixel receives the signal, the pixel can rotate a polarizationof, or transmit or reflect without causing a change in polarization ofincident light. The spatial light modulator(s) 87 can be a liquidcrystal device/display (LCD) and can be transmissive, reflective, ortransflective.

Each WGP 84, according to one of the WGP designs described herein, canbe located in one of the colored beams 83 _(c) prior to entering thespatial light modulator 87, after exiting the spatial light modulator87, or both. The WGP(s) 84 help form the colored image 83 _(i) bytransmitting, reflecting, or absorbing light of each pixel depending onthe type of WGP 84 and whether each pixel received the signal.

Another type of image projector 90 is shown in FIG. 9, and can comprisea light source 91, a projection lens system 85, a spatial lightmodulator 87, and a WGP 84. The light source 91 can sequentially emitmultiple, differently-colored light beams (colored beams) 93. Thecolored beams 93 can be primary colors. The projection lens system 85can be located to receive the colored beams 93 and can project a coloredimage 83 _(i) onto a screen 86. The projection lens system 85, spatiallight modulator 87, WGP 84, colored image 83 _(i), and screen 86 weredescribed above.

The spatial light modulator 87 can be located to receive, in a lightpath between the light source 91 and the projection lens system 85, thecolored beams 93. The WGP 84 can be located in the colored beams 93prior to entering the spatial light modulator 87 and after exiting thespatial light modulator 87.

IC Inspection Tool

Integrated circuits (ICs or IC) can be made of semiconductor materialand can include nanometer-sized features. ICs can be used in variouselectronic devices (e.g. computer, motion sensor, etc.). Defects in theIC can cause the electronic device to fail. Thus, inspection of the ICcan be important for avoiding failure of the electronic device, while inuse by the consumer. Such inspection can be difficult due to the smallfeature-size of IC components. Light, with small wavelengths (e.g.ultraviolet), can be used to inspect small feature-size components. Itcan be difficult to have sufficient contrast between these smallfeature-size components and defects or their surroundings. Use ofpolarized light can improve integrated circuit (IC) inspection contrast.It can be difficult to polarize the small wavelengths of light (e.g.ultraviolet/UV) used for IC inspection. Polarizers that can polarizesuch small wavelengths, and that can withstand exposure to high-energywavelengths of light, may be needed.

The WGPs described herein can polarize small wavelengths of light (e.g.UV) and can be made of materials sufficiently durable to withstandexposure to such light. An IC inspection tool 100 is shown in FIG. 10,comprising a light source 101 and a stage 102 for holding an IC wafer103. The light source 101 can be located to emit an incident light-beam105 (e.g. visible, ultraviolet, or x-ray) onto the IC wafer 103. Theincident light-beam 105 can be directed to the wafer 103 by optics (e.g.mirrors). The incident light-beam 105 can have an acute angle ofincidence 109 with a face of the wafer 103. To improve inspectioncontrast, a WGP 104 (according to an embodiment described herein) can belocated in, and can polarize, the incident light-beam 105.

A detector 107 (e.g. CCD) can be located to receive an output light-beam106 from the IC wafer 103. An electronic circuit 108 can be configuredto receive and analyze a signal from the detector 107 (the signal basedon the output light-beam 106 received by the detector 107). To improveinspection contrast, a WGP 104 (according to an embodiment describedherein) can be located in, and can polarize, the output light-beam 106.

Photo Alignment

The WGPs described herein can be used in the manufacture of flat paneldisplays (FPDs for plural or FPD for singular). FPDs can include analigned polymer film and liquid crystal. An FPD manufacturing tool 110is shown in FIG. 11, comprising a light source 111, a stage 112 forholding an FPD 113, and a WGP 114 (according to an embodiment describedherein). The light source 111 can emit ultraviolet light 115. The WGP114 can be located between the light source 111 and the stage 112 andcan polarize the ultraviolet light 115. Exposing the FPD 113 topolarized ultraviolet light 115 can align the polymer film. See U.S.Pat. Nos. 8,797,643 and 8,654,289, both incorporated herein byreference. Exposing the FPD 113 to polarized ultraviolet light 115 canhelp repair the FPD 113. See U.S. Pat. No. 7,697,108, which isincorporated herein by reference.

Methods

A method of making a WGP can include some or all of the following steps.The steps can be performed in the order shown, or alternate order:

-   1. Obtaining ribs 12 located over a surface of a transparent    substrate 11. The ribs 12 and the transparent substrate 11 can have    properties as described above. There can be gaps G between at least    a portion of the ribs 12. See FIG. 6.-   2. Exposing the WGP to ultraviolet light and/or ozone:    -   a. This step may be done before applying one or more of the        following: a proximal conformal-coating 13 _(p), a middle        conformal-coating 13 _(m), and a distal conformal-coating 13        _(d).    -   b. Exposing the WGP to ultraviolet light and ozone can be done        sequentially. or simultaneously.    -   c. A duration of this step can be less than two minutes in one        aspect or less than 20 minutes in another aspect.-   3. Applying a proximal conformal-coating 13 _(p). See FIGS. 2-3.-   4. Applying a middle conformal-coating 13 _(m). See FIG. 3.-   5. Plasma cleaning the WGP.    -   a. Plasma cleaning can generate more reactive groups on the        surface (i.e. surface of the ribs 12, proximal conformal-coating        13 _(p), or middle conformal-coating 13 _(m)), thus improving        bonding of the distal conformal-coating 13 _(d).    -   b. Non-limiting examples of plasmas include O₂, H₂, Ar, and N₂.    -   c. Plasma cleaning can be performed at various temperatures,        such as for example between 140° C. and 200° C.    -   d. One plasma, used for cleaning the WGP, included O₂ (flow rate        15 sccm) and H₂ (flow rate 10 sccm) at a power of 400 W for 5        minutes at a temperature of 160° C.-   6. Exposing the WGP to a gas.    -   a. The gas can include water vapor. The water vapor can have a        pressure of less than 100 Torr.    -   b. This step can increase the number of hydroxyl groups on the        underlying surface (e.g. ribs 12, proximal conformal-coating 13        _(p), or middle conformal-coating 13 _(m)), which can improve        bonding of phosphonate of the hydrophobic-layer.    -   c. Duration, pressure, and temperature of this step may need to        be carefully limited, depending on the rib structure and the        nature of the underlying surface, in order to avoid corrosion.-   7. Applying a distal conformal-coating 13 _(d).-   8. Baking the WGP. Baking can improve bonding of the    hydrophobic-layer.    -   a. Baking temperature examples: The WGP can be baked at greater        than between 100° C. in one aspect, greater than 130° C. in        another aspect, or greater than 150° C. in another aspect; and        less than 300° C. in one aspect, less than 320° C. in another        aspect, or less than 400° C. in another aspect.    -   b. Baking time examples: The WGP can be baked for at least 5        minutes, at least 10 minutes in another aspect; and less than 60        minutes in one aspect or less than 90 minutes in another aspect.    -   c. Baking at 150° C. for 15 minutes has been successful.

One, two, or every layer of the conformal coating (the proximalconformal-coating 13 _(p), the middle conformal-coating 13 _(m), and/orthe distal conformal-coating 13 _(d)) can have one or more of thefollowing characteristics:

-   -   1. can cover the underlying layer, e.g. an exposed surface of        the ribs 12, the proximal conformal-coating 13 _(p), or middle        conformal-coating 13 _(p);    -   2. can be applied by atomic layer deposition, vapor-deposition,        or other anhydrous deposition method;    -   3. can be applied at an elevated temperature, such as for        example at least 300° C. in one aspect, at least 350° C. in        another aspect, at least 400° C. in another aspect; and less        than 500° C. in one aspect or less than 600° C. in another        aspect;    -   4. can include a metal oxide;    -   5. can include hafnium oxide, zirconium oxide, aluminum oxide,        silicon oxide, silicon nitride, silicon oxynitride, a rare earth        oxide, or combinations thereof.    -   6. can be applied by exposing the WGP to a chemical, the        chemical including Si(R¹)_(d)(R²)_(e)(R³)_(g),        (R¹)_(i)PO(R⁴)_(j)(R⁵)_(k), or combinations thereof, where:    -   a. d is 1, 2, or 3, e is 1, 2, or 3, g is 0, 1, or 2, and        d+e+g=4;    -   b. i is 1 or 2, j is 1 or 2, k is 0 or 1, and i+j+k=3;    -   c. each R¹ is independently a hydrophobic group;    -   d. R² is a silane-reactive-group;    -   e. each silane-reactive-group is independently selected from:        —Cl, —OR⁶, —OCOR⁶, —N(R⁶)₂, and —OH;    -   f. R⁴ is a phosphonate-reactive-group;    -   g. each phosphonate-reactive-group is independently selected        from: —Cl, —OR⁶, —OCOR⁶, and —OH; and    -   h. each R⁶ is independently an alkyl group, an aryl group, or        combinations thereof.

The hydrophobic group, the phosphonate-reactive-group, thesilane-reactive-group, R⁶, R³, and R⁵ can have the properties asdescribed above. The silane chemical and the phosphonate chemical can beapplied sequentially or simultaneously.

What is claimed is:
 1. A wire grid polarizer (WGP) comprising: a. ribslocated over a surface of a transparent substrate, wherein the ribs areelongated and arranged in a substantially parallel array; b. gapsbetween at least a portion of the ribs; and c. a conformal-coatinglocated over the ribs, wherein: i. the conformal-coating comprises twolayers of different materials, including an oxidation-barrier and amoisture-barrier; ii. the oxidation-barrier includes aluminum oxide,silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, arare earth oxide, or combinations thereof; iii. the moisture-barrierincludes hafnium oxide, zirconium oxide, a rare earth oxide, orcombinations thereof; iv. the oxidation-barrier is located between themoisture-barrier and the ribs; and v. the oxidation-barrier is distinctfrom the ribs.
 2. A wire grid polarizer (WGP) comprising: a. ribslocated over a surface of a transparent substrate, wherein the ribs areelongated and arranged in a substantially parallel array; b. gapsbetween at least a portion of the ribs; and c. a conformal-coatinglocated over the ribs, wherein the conformal-coating includes a barrierlayer, the barrier layer including at least one of aluminum oxide,silicon oxide, silicon nitride, silicon oxynitride, silicon carbide,hafnium oxide, zirconium oxide, and a rare earth oxide.
 3. The WGP ofclaim 2, wherein the barrier-layer is distinct from the ribs.
 4. The WGPof claim 2, wherein a material of an exterior surface of the ribs hassolubility in water of at least 0.015 grams per liter at 25° C.
 5. TheWGP of claim 2, wherein a material of an exterior surface of the ribsincludes germanium.
 6. The WGP of claim 2, wherein: a. the barrier-layercomprises two layers of different materials, including anoxidation-barrier and a moisture-barrier; b. the oxidation-barrierincludes aluminum oxide, silicon oxide, silicon nitride, siliconoxynitride, silicon carbide, or combinations thereof; c. themoisture-barrier includes hafnium oxide, zirconium oxide, orcombinations thereof; and d. the oxidation-barrier is located betweenthe moisture-barrier and the ribs.
 7. The WGP of claim 6, wherein theoxidation-barrier has a thickness of less than 5 nanometers and themoisture-barrier has a thickness of less than 5 nanometers.
 8. The WGPof claim 2, wherein: a. the conformal-coating further comprises ahydrophobic-layer located over the ribs; b. the barrier-layer is locatedbetween the hydrophobic-layer and the ribs; and c. the hydrophobic-layerincludes a phosphonate conformal-coating, wherein the phosphonateconformal-coating includes:

where: i. each R¹ independently is a hydrophobic group; ii. Z is a bondto the ribs; and iii. R⁵ is a chemical element or a group.
 9. The WGP ofclaim 8, wherein: a. R⁵ is a phosphonate-reactive-group, R¹, R⁶, or Z;b. the phosphonate-reactive-group is —Cl, —OR⁶, —OCOR⁶, or —OH; and 10.The WGP of claim 8, wherein the hydrophobic-layer urther comprises asilane conformal-coating, wherein the silane conformal-coating includeschemical formula (1), chemical formula (2), or combinations thereof:

where: a. r is a positive integer; b. X is a bond to the ribs; and c.each R³ is independently a chemical element or a group.
 11. The WGP ofclaim 10, wherein: a. each R³ is independently selected from the groupconsisting of: a silane-reactive-group, —H, R¹, R⁶, and X; b. eachsilane-reactive-group is independently selected from the groupconsisting of: —Cl, —OR⁶, —OCOR⁶, —N(R⁶)₂, and —OH; and c. each R⁶ isindependently an alkyl group, an aryl group, or combinations thereof.12. The WGP of claim 10, wherein: a. each of the ribs includes a rod anda wire; b. the wire is reflective; c. the rod is absorptive; d. X is abond to the rod; and e. Z is a bond to the wire.
 13. The WGP of claim10, wherein: a. X is —O—Si; and b. Z is —O-Metal, where Metal is a metalatom.
 14. The WGP of claim 2, wherein: a. the conformal-coating furthercomprises a hydrophobic-layer located over the ribs; b. thebarrier-layer is located between the hydrophobic-layer and the ribs; andc. the hydrophobic-layer includes a silane conformal-coating, whereinthe the silane conformal-coating includes chemical formula (1), chemicalformula (2), or combinations thereof:

where: i. r is a positive integer; ii. X is a bond to the ribs; and iii.each R³ is independently a chemical element or a group.
 15. A method ofmaking a wire-grid polarizer, the method comprising: a. obtaining anarray of ribs located over a surface of a transparent substrate, theribs being substantially parallel and elongated with gaps between atleast a portion of the ribs; and b. applying a barrier layer of aconformal-coating over the ribs by vapor deposition, the barrier layerincluding at least one of aluminum oxide, silicon oxide, siliconnitride, silicon oxynitride, silicon carbide, hafnium oxide, andzirconium oxide.
 16. The method of claim 15, further comprising applyinga hydrophobic-layer of the conformal-coating by vapor deposition afterapplying the barrier layer, wherein applying the hydrophobic-layerincludes exposing the WGP to a chemical, the chemical including(R¹)_(i)PO(R⁴)_(j)(R⁵)_(k), where: a. i is 1 or 2, j is 1 or 2, k is 0or 1, and i+j+k=3; b. each R¹ is independently a hydrophobic group; c.R⁴ is a phosphonate-reactive-group; d. each phosphonate-reactive-groupis independently selected from: —Cl, —OR⁶, —OCOR⁶, and —OH; e. each R⁶is independently an alkyl group, an aryl group, or combinations thereof;17. The method of claim 16, wherein the chemical further comprisesSi(R¹)_(d)(R²)_(e)(R³)_(g), where: a. d is 1, 2, or 3, e is 1, 2, or 3,g is 0, 1, or 2, and d+e+g=4; b. R² is a silane-reactive-group; and c.each silane-reactive-group is independently selected from: —Cl, —OR⁶,—OCOR⁶, —N(R⁶)₂, and —OH.
 18. The method of claim 15, further comprisingapplying a hydrophobic-layer of the conformal-coating by vapordeposition after applying the barrier layer, wherein applying thehydrophobic-layer includes exposing the WGP to a chemical, the chemicalincluding Si(R¹)_(d)(R²)_(e)(R³)_(g), where: a. d is 1, 2, or 3, e is 1,2, or 3, g is 0, 1, or 2, and d+e+g=4; b. R² is a silane-reactive-group;and c. each silane-reactive-group is independently selected from: —Cl,—OR⁶, —OCOR⁶, —N(R⁶)₂, and —OH.
 19. The method of claim 15, whereinapplying the barrier layer includes applying the barrier layer by atomiclayer deposition at a temperature of at least 300° C.
 20. The method ofclaim 15, wherein: a. applying the barrier layer includes applying anoxidation-barrie hen applying a moisture-barrier; b. theoxidation-barrier includes aluminum oxide, silicon oxide, siliconnitride, silicon oxynitride, silicon carbide, or combinations thereof;and c. the moisture-barrier includes hafnium oxide, zirconium oxide, orcombinations thereof.